CAMP has a New Chemical Mechanical Planarization Facility and Cleanroom

The newly upgraded CMP facility at Clarkson’s CAMP will distinguish itself from the few universities around the world that have a comparable capability. A unique and practical two tier approach is being implemented. It will allow for screening work of preliminary wafer processing to be conducted in a less stringent environment in Room 119 CAMP. Also it will provide a Class 10 Cleanroom (Room 128 CAMP) for highly critical work requiring a more restricted environment. In Room 128 CAMP, evaluations of CMP consumables and processes on two dominating planarization platforms (rotary and orbital) can be performed with the two polishers (Speedfam/IPEC 676 and Strasbaugh nHance) side-by-side, a feature that can not be easily found in an academic environment. Furthermore, the Strasbaugh nHance and associated metrology tools (when fully commissioned) will allow researchers to study planarization processes for wafers up to 300 mm, a capability only a very few universities around the world can match.

In addition to the facility, the Clarkson group will conduct world-class research that has profound practical implications. For example, unlike conventional inorganic abrasive-based slurries, Clarkson University investigators have been and will continue to investigate the slurries that are based on a much softer organic abrasive which may lead to low defects and high production yields. Departing from traditional methods of in-situ monitoring and end-point detection, Clarkson University investigators will team up with industrial partners and innovators in the field to develop a comprehensive smart sensor system that will integrate the functions of in-situ monitoring of the polishing progress, end-point detecting, and defect reporting, with significant potential for monetary savings for the industry.




CAMP and Clarkson University Host Colloid and Surface Science Symposium

Also experts made oral and/or poster presentations on the scientific advances and real-world applications occurring within their particular area of research. Although their subject matter is as small as one ten millionth of a centimeter, the impact of their work is highly significant. Small particle research continues to change the landscape in manufacturing, drugs, computing, defense, aerosols, printing and photography, painted and coated surfaces, dairy products, smart materials, and a host of other fields.

Plenary Speakers from left: Sir John M. Thomas ( Professor at the Royal Institution of Great Britain, London and the Department of Materials Science and Metallurgy at the University of Cambridge in London, UK) and Professor Gabor A. Somorjai (Department of Chemistry and Lawrence Berkeley National Laboratory at the University of California at Berkeley). Sir John Thomas ( recipient of an Honorary Doctorate at the Conference) spoke about “Single-Site Heterogeneous Catalysts.” Professor Somorjai spoke about “The Nanoscience Revolution, Merging of Colloid Science, Catalysis and Nanoelectronics.”




Plenary Speaker Professor Marie-Paule Pileni (of the University of P.& M. Curie in Paris, France) and CAMP Distinguished Professor of Chemistry Janos Fendler (Chair of the Colloid Symposium). Professor Pileni’s presentation was titled “Self Organization of Nanomaterials.”

Technical sessions at the Symposium included topics such as advanced nanostructured materials, aggregation and deposition of colloidal particles, nanoparticles, colloids and surfaces in advanced catalytic materials, nanostructures for quantum device technology, rheology and dynamics of complex fluids, and the interface of nanoparticles and colloids in consumer products, in medical/biochemical diagnostic applications, in the environment, in pharmaceuticals and in drug delivery applications. Also a special symposium was held in honor of former Clarkson Chemistry Department Chair and Professor Stig Friberg. Professor Per-Olof Glantz (Department of Prosthetic Dentistry, Faculty of Odontology & President of Malmö University in Sweden) presented a talk (titled “Surface Chemical Aspects of Treatments with Dental Implants”) in honor of Professor Friberg, his former mentor. This paper gave an overview of the problems with dental implants as well as recent data supporting the view that the establishment of undisturbed, initial contacts between living cells and implant materials with defined surface chemical characteristics, is an absolute prerequisite for long term clinical success with modern dental implant systems.

Colloid Symposium includes Honorary Doctorate Ceremony for Professor Sir John Thomas of the Davy Faraday Research laboratory, The Royal Institution in London (center of photo).
From left: CAMP Professor Yuzhuo Li (General Program Chair), CAMP Distinguished Professor of Chemistry Janos Fendler (Symposium Chair), Professor Egon Matijevic' (the Victor K. LaMer Chair in Colloid and Surface Science), Professor Sir John Thomas, Clarkson University President Anthony Collins, CAMP Professor Dan Goia (Chair for Industrial and Government Relations), and Distinguished University Professor / CAMP Director S.V. Babu.