Spring MRS Meeting
Chemical-Mechanical Planarization
(coorganizers: S.V. Babu, R. Singh, M. Oliver and N. Hayasaka)
San Francisco, California,
April 2 - 3, 2002


American Chemical Society's ShortCourse
"Surfactant, Micelles Liposomes, and Liquid Crystals in Emulsions and Microemulsions"
Course Instructors:
Chemistry Professor Yuzhuo Li (Clarkson University) & Emeritus Professor of Chemistry Stig Friberg ( Clarkson University)
Clarkson University, Potsdam, New York
May 6 - 10, 2002
(To register call 800-227-5558 or 202-872-4600 or register on line at http://www.acs.org/shortcourses.)


 CAMP's Annual Technical Meeting
Gideon-Putnam Hotel & Conference Center
Saratoga Springs, New York,
May 13-15, 2002


Short Course
"Surface Modification of Particles for Improved Performance: Introduction to Particle Coating Technology"

Course Instructors:
Dr. Richard Partch, Senior University Professor, CAMP;
Dr. Curtis Zimmermann ,
Manager of New Technol
ogies of Engelhard Corporation

CAMP, Clarkson University, Potsdam, New York
May 16 -17, 2002


Workshop: Quantum Device Technology

Center for Quantum Device Technology Clarkson University,
Potsdam, New York
May 20-24, 2002


Seventh International Symposium on
Chemical- Mechanical Polishing (CMP)

Hilton Resort, Lake Placid, New York
August 11 - 14, 2002


CAMP Fall Meeting

Potsdam, New York
October 16-18, 2002


(For information about CAMP industrial short courses, please call Professor Richard Partch at 315-268-2351 or send e-mail to him at partch@clarkson.edu).

** Information, on these and other CAMP events, is available at the CAMP web site at http://www.clarkson.edu/camp.

Dr. America with his Research Advisers.
From left: CAMP Professor Raymond Mackay, Dr. William America of IBM, and CAMP Director/Vice Provost S.V. Babu.

William America First to Complete External Ph.D. Program at Clarkson University

William America of IBM (a Corporate Sponsor of CAMP) was the first candidate to complete Clarkson University's External Ph.D. Program. Dr. America is a Senior Engineer/Scientist-Development for IBM Microelectronics. CAMP Director/Vice Provost S.V. Babu and Clarkson University's Chemistry Professor Raymond Mackay served as his research advisers for the graduate program. His thesis for the Ph.D. in Chemistry is titled "Chemical-Mechanical Planarization and Charge Coupled Device Technology." Dr. America investigated the use of chemical-mechanical polishing (CMP), which is routinely used in semiconductor fabrication, to create new structures that are not practical without it. In particular is a Damascene CMP process that enables materials such as copper to be made into structures typically not possible with plasma or wet etching. CMP can also be applied to optical imaging devices like CCDs that also enable new and advanced structures. Indium tin oxide can be transformed with a special Damascene technique into thin optically transparent electrodes. These specially created electrodes offer the potential for high device yield, improved spectral performance and significantly improved pictures for the consumer.

Representatives from Composite Factory, Inc. visit CAMP. From left: CAMP Professor Greg Campbell, CAMP Director/Vice Provost S.V. Babu, Chad Rittershausen of Composite Factory, Inc., Steve Atmur General Manager of Composite Factory, Inc., and Senior University Professor Richard Partch of CAMP.