Currently Dr. Sokolov has six grants. He is a leading Co-PI on the $2M ARO grant, for the group studying self-healing materials. Sokolov has 85 refereed publications and his work has been cited 1182 times as of October of 2005. Also he has one full US patent, and seven US patents and one International patent pending. In addition Sokolov has given 63 invited lectures, seminars, and conference presentations and participated in 41 conferences with contributed presentations.
Since starting his faculty position at Clarkson in 2000, Sokolov has taught 27 (13 different courses ) undergraduate and graduate level courses. He is a member of APS, ACS, ABS, MRS, and ASME societies. Also he serves on NSF panels and is a reviewer for more than a dozen international journals. In addition, Sokolov was a referee for NSF, PRF, US Army Research, and Research Corporation proposals.
Company Supporters of Professor Li’s Research Join CAMP
Several companies, which support Professor Yuzhuo Li’s research in the area of CMP, recently joined CAMP as Corporate Members. These companies include Mipox, ASPT, and Air Liquide. Mipox has featured an interview with Professor Li at the company website (http://www.mipox.co.jp/en/index.html). Here Professor Li mentions that his current CMP activities focus on consumables such as slurry and pad development.
Distinguished University Professor S.V. Babu and CAMP Professor Li: Invited Speakers at an Electrochemical Society Sponsored CMP Symposium and at Fudan University in Shanghai, China
Distinguished University Professor / CAMP Director S.V. Babu and CAMP Professor Yuzhuo Li gave invited talks at the 5th Chemical Mechanical Planarization Symposium held in association with the SEMICON China 2006 in Shanghai, China during March of this year. Professor Babu discussed his group’s recent studies on the use of some surfactants to enhance the planarization efficiency of slurries used for copper CMP. Professor Li described his investigations on the mechanism of a surface defect called edge over erosion (EOE). In addition to the symposium at SEMICON China, Professor Babu gave an invited talk at the Novellus-Fudan Copper Interconnect Research Center of Fudan University. Professors Babu and Li toured the new microelectronic research facility and discussed the possibility of collaboration. They also visited the Shanghai Institute of Microsystem and Information Technology, a branch of the Chinese Academy of Sciences in Shanghai.
CAMP Professor Dan Goia
CAMP Professor of Chemistry Dan Goia has been granted tenure. Goia obtained his MS degree from University of Cluj ( Romania) in 1980 and his Ph.D. degree from Clarkson University in 1998. After a successful career in industry, he joined Clarkson University in October 2001 as a full time employee, presently holding the position of Associate Professor in the Department of Chemistry and the Center for Advanced Materials Processing (CAMP). Prior to his move to Clarkson, Professor Goia worked for more than 20 years in the research organizations of several companies involved in the development and manufacturing of fine particles (pigments, metals, ceramics, etc.); his latest position being R&D Director in the Electronic Materials Division of dmc2 Corporation, formerly Degussa Corporation. For the last two decades, his research has been focused on the preparation, characterization, and modification of micrometer and nanometer size simple and composite metallic particles for electronic, catalytic, metallurgical, optical, and medical applications. While at Clarkson, he has been particularly interested in the elucidation of the fundamental mechanisms governing the formation of highly dispersed uniform particles in homogeneous solutions. In this area he has authored 28 publications and 14 patents and enjoys worldwide recognition in both academic and industrial circles, as testified by the frequent invitations to lecture both in the US and abroad. As a result, his research at Clarkson has brought significant financial support (over 3 million dollars in outside grants since 2002) from government agencies, as well as industry. Professor Goia is also an active member of the Chemistry department teaching undergraduate and graduate courses in analytical, inorganic, and materials chemistry and supervising and mentoring undergraduate and graduate students, as well as postdoctoral associates. He has also been actively involved in organizing several international, national, and local scientific meetings and symposia. In addition to his research and scholarly work, Goia has been particularly effective in leveraging his industrial experience on behalf of the Center for Advanced Materials Processing (CAMP) by convincing several companies located in NY, as well as some large multinational corporations, to support research projects at Clarkson University. His research has already materialized in novel technologies of significant and immediate practical value. Several of these new processes (which have been patented, licensed, and scaled up by the sponsoring companies) have resulted in successfully commercialized products.